Open AccessTin removal by an annular surface wave plasma antenna in an extreme ultraviolet lithography source
Author(s) -
Dren Qerimi,
Andrew C. Herschberg,
Gianluca A. Panici,
Parker Hays,
Tyler Pohlman,
D. N. Ruzic
Publication year - 2022
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/5.0094375
Subject(s) - tin , extreme ultraviolet lithography , extreme ultraviolet , plasma , hydride , ion , analytical chemistry (journal) , plasma cleaning , ultraviolet , materials science , hydrogen , chemistry , optoelectronics , optics , metallurgy , laser , physics , environmental chemistry , organic chemistry , quantum mechanics