Open AccessPreface to Special Topic “Plasma Physics and Science in Current and Next Generation Semiconductor Process”: Invited papers from The 8th International Conference on Microelectronics and Plasma Technology
Author(s) -
HyoChang Lee
Publication year - 2022
Publication title -
physics of plasmas
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.75
H-Index - 160
eISSN - 1089-7674
pISSN - 1070-664X
DOI - 10.1063/5.0093975
Subject(s) - physics , microelectronics , plasma , engineering physics , process (computing) , semiconductor , library science , engineering ethics , nuclear physics , optoelectronics , engineering , computer science , operating system
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