Open AccessPlasma enhanced chemical vapor deposition of p-type Cu2O from metal organic precursors
Author(s) -
Daisy Gomersall,
Andrew J. Flewitt
Publication year - 2022
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/5.0089757
Subject(s) - plasma enhanced chemical vapor deposition , nucleation , materials science , amorphous solid , chemical vapor deposition , deposition (geology) , analytical chemistry (journal) , chemical engineering , nanotechnology , chemistry , crystallography , paleontology , organic chemistry , chromatography , sediment , engineering , biology
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