Open AccessProgress and prospects of III-nitride optoelectronic devices adopting lift-off processes
Author(s) -
Wai Yuen Fu,
H. W. Choi
Publication year - 2022
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/5.0089750
Subject(s) - optoelectronics , materials science , lift (data mining) , epitaxy , sapphire , photonics , nitride , substrate (aquarium) , nanotechnology , flexibility (engineering) , thin film , computer science , engineering physics , optics , laser , engineering , physics , statistics , mathematics , layer (electronics) , geology , data mining , oceanography
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom