Open AccessControlling pinhole radius and areal density in a-Si/SiOx using metal-assisted chemical etching
Author(s) -
Caroline Lima Salles,
William Nemeth,
Harvey Guthrey,
Sumit Agarwal,
Paul Stradins
Publication year - 2022
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/5.0089213
Subject(s) - materials science , silicon , etching (microfabrication) , amorphous solid , isotropic etching , mesoporous material , oxide , nanotechnology , optoelectronics , chemical engineering , pinhole (optics) , nanoparticle , optics , layer (electronics) , metallurgy , crystallography , chemistry , organic chemistry , physics , engineering , catalysis
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