Nanoscale multiply charged focused ion beam platform for surface modification, implantation, and analysis | Zendy

Mathieu Lalande | Zendy; Pierre Salou | Zendy; A. Houël | Zendy; T. Been | Zendy; Thierry Birou | Zendy; Charles Bourin | Zendy; A. Cassimi | Zendy; Arthur D. A. Keizer | Zendy; Jean-Baptiste Mellier | Zendy; Jean-Marc Ramillon | Zendy; Anthony Sineau | Zendy; Anne Delobbe | Zendy; S. Guillous | Zendy

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Nanoscale multiply charged focused ion beam platform for surface modification, implantation, and analysis

Author(s) -

Mathieu Lalande,

Pierre Salou,

A. Houël,

T. Been,

Thierry Birou,

Charles Bourin,

A. Cassimi,

Arthur D. A. Keizer,

Jean-Baptiste Mellier,

Jean-Marc Ramillon,

Anthony Sineau,

Anne Delobbe,

S. Guillous

Publication year - 2022

Publication title -

review of scientific instruments

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.605

H-Index - 165

eISSN - 1089-7623

pISSN - 0034-6748

DOI - 10.1063/5.0078914

Subject(s) - materials science , focused ion beam , ion implantation , ion beam , ion , electron cyclotron resonance , nanometre , highly charged ion , scanning electron microscope , microscope , ion beam deposition , nanoscopic scale , electron beam induced deposition , optoelectronics , ion source , beam (structure) , optics , nanotechnology , physics , scanning transmission electron microscopy , composite material , quantum mechanics

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