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The spectrum of a 1- μ m-wavelength-driven tin microdroplet laser-produced plasma source in the 5.5–265.5 nm wavelength range
Author(s) -
Zoi Bouza,
Jeff D. Byers,
Joris Scheers,
Ruben Schupp,
Yahia Mostafa,
L. Behnke,
Z. Mazzotta,
J. Sheil,
W. Ubachs,
R. Hoekstra,
Muharrem Bayraktar,
Oscar O. Versolato
Publication year - 2021
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0073839
Subject(s) - extreme ultraviolet lithography , extreme ultraviolet , nanolithography , materials science , tin , laser , optics , spectrometer , wavelength , optoelectronics , diffraction grating , plasma , spectral line , plasma diagnostics , physics , medicine , alternative medicine , pathology , quantum mechanics , astronomy , fabrication , metallurgy

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