Aluminum (Oxy)nitride thin films grown by fs-PLD as electron emitters for thermionic applications | Zendy

Alessandro Bellucci | Zendy; S. Orlando | Zendy; M. Girolami | Zendy; Matteo Mastellone | Zendy; Valerio Serpente | Zendy; Barbara Paci | Zendy; Amanda Generosi | Zendy; Alessio Mezzi | Zendy; S. Kačiulis | Zendy; Riccardo Polini | Zendy; D.M. Trucchi | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Aluminum (Oxy)nitride thin films grown by fs-PLD as electron emitters for thermionic applications

Author(s) -

Alessandro Bellucci,

S. Orlando,

M. Girolami,

Matteo Mastellone,

Valerio Serpente,

Barbara Paci,

Amanda Generosi,

Alessio Mezzi,

S. Kačiulis,

Riccardo Polini,

D.M. Trucchi

Publication year - 2021

Publication title -

aip conference proceedings

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.177

H-Index - 75

eISSN - 1551-7616

pISSN - 0094-243X

DOI - 10.1063/5.0068496

Subject(s) - materials science , thermionic emission , nitride , pulsed laser deposition , thin film , work function , tantalum nitride , cathode , tantalum , optoelectronics , aluminium , oxide , chemical engineering , analytical chemistry (journal) , nanotechnology , layer (electronics) , electron , composite material , metallurgy , physics , quantum mechanics , chemistry , chromatography , engineering

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research