Open AccessPhotoablative lithography of cellulose acetate at 172 nm: Subtractive 3D printing of biodegradable optical microstructures and molds for polydimethylsiloxane patterning
Author(s) -
Andrey E. Mironov,
Sehyun Park,
Jinhong Kim,
Dane J. Sievers,
SungJin Park,
Stefan Spirk,
J. G. Eden
Publication year - 2021
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/5.0065511
Subject(s) - polydimethylsiloxane , materials science , cellulose acetate , cellulose , polymer , soft lithography , lithography , photoresist , photomask , photolithography , nanotechnology , chemical engineering , optoelectronics , composite material , fabrication , resist , medicine , alternative medicine , pathology , layer (electronics) , engineering
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