A study on the diffusion properties of oxygen in Al and W-doped λ-Ta2O5
Author(s) -
Xinghui Wu,
Nana Cui,
Qiuhui Zhang,
Wenju Wang,
Qixing Xu
Publication year - 2021
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0064536
Subject(s) - doping , dopant , diffusion , materials science , oxygen , vacancy defect , acceptor , band gap , orthorhombic crystal system , activation energy , diffusion barrier , ion , analytical chemistry (journal) , chemistry , nanotechnology , condensed matter physics , crystallography , optoelectronics , thermodynamics , crystal structure , physics , organic chemistry , layer (electronics) , chromatography
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