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Simulation results of the gas rarefaction and target ion evolution in a chopped high power impulse magnetron sputtering discharge
Author(s) -
Chunqing Huo,
Yingxi Ji,
Shijie Xie,
Runwei Song,
Qiang Chen
Publication year - 2021
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0062990
Subject(s) - high power impulse magnetron sputtering , materials science , sputter deposition , impulse (physics) , ionization , ion , sputtering , plasma , optoelectronics , atomic physics , chemistry , nanotechnology , physics , thin film , organic chemistry , quantum mechanics

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