Open AccessFluid simulation of the plasma uniformity in new multi-directional source capacitively coupled plasma
Author(s) -
Wenchong Ouyang,
Chengbiao Ding,
Qi Liu,
Shuzhan Gao,
Weifeng Deng,
Zhengwei Wu
Publication year - 2021
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0062272
Subject(s) - capacitively coupled plasma , microelectronics , plasma , capacitor , inductively coupled plasma , materials science , semiconductor , electron density , argon , plasma parameters , optoelectronics , chemistry , atomic physics , electrical engineering , physics , voltage , engineering , quantum mechanics
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