Open AccessEvidence for oxygen being a dominant shallow acceptor in p-type CuI
Author(s) -
Philipp Storm,
Stephan Gierth,
Susanne Selle,
Michael S. Bar,
Holger von Wenckstern,
Marius Grundmann,
Michael Lorenz
Publication year - 2021
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/5.0047723
Subject(s) - acceptor , thin film , materials science , conductivity , oxygen , pulsed laser deposition , semiconductor , partial pressure , doping , diffusion , oxygen pressure , electrical resistivity and conductivity , analytical chemistry (journal) , nanotechnology , optoelectronics , chemical engineering , chemistry , condensed matter physics , environmental chemistry , organic chemistry , thermodynamics , physics , engineering , electrical engineering
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