Open AccessEpitaxial growth of (AlxGa1−x)2O3 thin films on sapphire substrates by plasma assisted pulsed laser deposition
Author(s) -
Zewei Chen,
Makoto Arita,
Katsuhiko Saito,
Tooru Tanaka,
Qixin Guo
Publication year - 2021
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0046237
Subject(s) - x ray photoelectron spectroscopy , sapphire , materials science , pulsed laser deposition , thin film , analytical chemistry (journal) , band gap , epitaxy , wide bandgap semiconductor , plasma , diffraction , optoelectronics , laser , optics , nanotechnology , chemistry , chemical engineering , physics , chromatography , layer (electronics) , quantum mechanics , engineering
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