Open AccessLow temperature growth of stress-free single phase α-W films using HiPIMS with synchronized pulsed substrate bias
Author(s) -
Tetsuhide Shimizu,
Kazuki Takahashi,
Robert Boyd,
Rommel Paulo B. Viloan,
Julien Kéraudy,
Daniel Lundin,
Ming Yang,
Ulf Helmersson
Publication year - 2021
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/5.0042608
Subject(s) - materials science , tungsten , high power impulse magnetron sputtering , sputtering , annealing (glass) , electrical resistivity and conductivity , analytical chemistry (journal) , thin film , sputter deposition , biasing , substrate (aquarium) , composite material , nanotechnology , chemistry , metallurgy , voltage , electrical engineering , oceanography , engineering , chromatography , geology
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