Open AccessRapid formation of large-area MoS2 monolayers by a parameter resilient atomic layer deposition approach
Author(s) -
Marco A. Gonzalez,
Devendrá Pareek,
Lukas Büsing,
Marcel Beer,
Jürgen Parisi,
Sascha Schäfer,
Levent Gütay
Publication year - 2021
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/5.0041042
Subject(s) - monolayer , materials science , photoluminescence , atomic layer deposition , raman spectroscopy , transmission electron microscopy , layer (electronics) , chemical vapor deposition , deposition (geology) , micrometer , nanotechnology , analytical chemistry (journal) , chemical engineering , optoelectronics , optics , chemistry , paleontology , physics , engineering , chromatography , sediment , biology
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