Open AccessControl of gas concentration distribution in a semiconductor process chamber using CT-TDLAS measurement
Author(s) -
Daisuke Hayashi,
Yuhei Sakaguchi,
Masakazu Minami
Publication year - 2021
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0037758
Subject(s) - analytical chemistry (journal) , volumetric flow rate , radius , distribution uniformity , materials science , absorption (acoustics) , spectral line , diode , head (geology) , chemistry , optics , atomic physics , physics , optoelectronics , computer security , chromatography , quantum mechanics , astronomy , computer science , composite material , geomorphology , geology
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom