z-logo
open-access-imgOpen Access
A method for characterizing near-interface traps in SiC metal–oxide–semiconductor capacitors from conductance–temperature spectroscopy measurements
Author(s) -
Jordan R. Nicholls,
Arnar M. Vidarsson,
Daniel Haasmann,
E.Ö. Sveinbjörnsson,
Sima Dimitrijev
Publication year - 2021
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/5.0037744
Subject(s) - materials science , quantum tunnelling , optoelectronics , transistor , oxide , capacitor , semiconductor , conductance , wide bandgap semiconductor , thermal conduction , spectroscopy , fabrication , field effect transistor , analytical chemistry (journal) , condensed matter physics , electrical engineering , chemistry , voltage , physics , medicine , alternative medicine , quantum mechanics , pathology , chromatography , metallurgy , composite material , engineering

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom