Open AccessNext generation ferroelectric materials for semiconductor process integration and their applications
Author(s) -
Thomas Mikolajick,
Stefan Slesazeck,
Halid Mulaosmanovic,
Min Hyuk Park,
Simon Fichtner,
Patrick D. Lomenzo,
Michael Hoffmann,
Uwe Schroeder
Publication year - 2021
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/5.0037617
Subject(s) - ferroelectricity , materials science , nanotechnology , scandium , semiconductor , nitride , engineering physics , electronics , optoelectronics , electrical engineering , engineering , dielectric , metallurgy , layer (electronics)
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