Investigation of device transport characteristics enhancement of In0.53Ga0.47As MOSFET through in situ NH3/N2 remote-plasma treatment
Author(s) -
Ping Huang,
Quang Ho Luc,
A. Sibaja-Hernandez,
Che-Wei Hsu,
JingYuan Wu,
Hua-Lun Ko,
Nhan-Ai Tran,
N. Collaert,
Edward Yi Chang
Publication year - 2021
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0037378
Subject(s) - transconductance , materials science , mosfet , plasma , subthreshold swing , acceptor , field effect transistor , optoelectronics , transistor , analytical chemistry (journal) , electrical engineering , chemistry , condensed matter physics , physics , voltage , quantum mechanics , chromatography , engineering
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