Open AccessCalcium fluoride as high-k dielectric for 2D electronics
Author(s) -
Chao Wen,
Mario Lanza
Publication year - 2021
Publication title -
applied physics reviews
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.084
H-Index - 66
ISSN - 1931-9401
DOI - 10.1063/5.0036987
Subject(s) - dielectric , materials science , electronics , atomic layer deposition , high κ dielectric , chemical vapor deposition , calcium , optoelectronics , nanotechnology , wafer , fluoride , thin film , chemistry , inorganic chemistry , metallurgy
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