Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1−xO2 thin films using synchrotron x-ray analysis | Zendy

Takashi Onaya | Zendy; Toshihide Nabatame | Zendy; Yong Chan Jung | Zendy; Heber Hernández-Arriaga | Zendy; Jaidah Mohan | Zendy; Harrison Sejoon Kim | Zendy; Naomi Sawamoto | Zendy; ChangYong Nam | Zendy; Esther H. R. Tsai | Zendy; Takahiro Nagata | Zendy; Jiyoung Kim | Zendy; Atsushi Ogura | Zendy

Open Access

Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1−xO2 thin films using synchrotron x-ray analysis

Author(s) -

Takashi Onaya,

Toshihide Nabatame,

Yong Chan Jung,

Heber Hernández-Arriaga,

Jaidah Mohan,

Harrison Sejoon Kim,

Naomi Sawamoto,

ChangYong Nam,

Esther H. R. Tsai,

Takahiro Nagata,

Jiyoung Kim,

Atsushi Ogura

Publication year - 2021

Publication title -

apl materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.571

H-Index - 60

ISSN - 2166-532X

DOI - 10.1063/5.0035848

Subject(s) - ferroelectricity , orthorhombic crystal system , materials science , analytical chemistry (journal) , tetragonal crystal system , annealing (glass) , synchrotron , x ray crystallography , thin film , phase (matter) , atomic layer deposition , dielectric , diffraction , crystallography , optics , chemistry , crystal structure , nanotechnology , optoelectronics , composite material , organic chemistry , chromatography , physics

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