Imprint issue during retention tests for HfO2-based FRAM: An industrial challenge?
Author(s) -
Jordan Bouaziz,
Pédro Rojo Romeo,
Nicolas Baboux,
Bertrand Vilquin
Publication year - 2021
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/5.0035687
Subject(s) - data retention , exponential function , polarization (electrochemistry) , ferroelectricity , materials science , mathematics , condensed matter physics , physics , chemistry , mathematical analysis , optoelectronics , dielectric
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