Open AccessMulti-shot damage on Mo/Si multilayer induced by nanosecond EUV radiation
Author(s) -
Wenbin Li,
Liuyang Pan,
Chunlin Wang,
Zhe Zhang,
Chun Xie,
Qiushi Huang,
Zhanshan Wang
Publication year - 2021
Publication title -
aip advances
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0035490
Subject(s) - extreme ultraviolet lithography , fluence , nanosecond , materials science , extreme ultraviolet , optics , full width at half maximum , shot (pellet) , radiation damage , radiation , ultraviolet , tungsten , impact crater , irradiation , optoelectronics , laser , physics , astronomy , nuclear physics , metallurgy
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