Open AccessIdentification of LiNi and VNi acceptor levels in doped nickel oxide
Author(s) -
Robert Karsthof,
Holger von Wenckstern,
Vegard Skiftestad Olsen,
Marius Grundmann
Publication year - 2020
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/5.0032102
Subject(s) - materials science , non blocking i/o , acceptor , nickel oxide , doping , band gap , tin oxide , thin film , heterojunction , nickel , analytical chemistry (journal) , optoelectronics , nanotechnology , condensed matter physics , metallurgy , chemistry , biochemistry , physics , chromatography , catalysis
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