Compensating for artifacts in scanning near-field optical microscopy due to electrostatics | Zendy

Tobias Nörenberg | Zendy; Lukas Wehmeier | Zendy; Denny Lang | Zendy; Susanne C. Kehr | Zendy; Lukas M. Eng | Zendy

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Compensating for artifacts in scanning near-field optical microscopy due to electrostatics

Author(s) -

Tobias Nörenberg,

Lukas Wehmeier,

Denny Lang,

Susanne C. Kehr,

Lukas M. Eng

Publication year - 2021

Publication title -

apl photonics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 2.094

H-Index - 34

ISSN - 2378-0967

DOI - 10.1063/5.0031395

Subject(s) - near field scanning optical microscope , kelvin probe force microscope , electric field , scanning probe microscopy , microscopy , scanning capacitance microscopy , materials science , nanoscopic scale , optics , optical microscope , electrostatic force microscope , atomic force acoustic microscopy , non contact atomic force microscopy , scanning ion conductance microscopy , conductive atomic force microscopy , scattering , vibrational analysis with scanning probe microscopy , optoelectronics , piezoresponse force microscopy , semiconductor , nanotechnology , dielectric , scanning confocal electron microscopy , atomic force microscopy , scanning electron microscope , magnetic force microscope , physics , quantum mechanics , magnetization , magnetic field , ferroelectricity

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