Open AccessTertiary alkyl halides as growth activator and inhibitor for novel atomic layer deposition of low resistive titanium nitride
Author(s) -
Changbong Yeon,
JaeSun Jung,
HyeRan Byun,
Kok Chew Tan,
TaeHo Song,
Sojung kim,
Jin Hee Kim,
Seok Jong Lee,
Youngsoo Park
Publication year - 2021
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0031127
Subject(s) - atomic layer deposition , alkyl , iodide , halide , tin , activator (genetics) , materials science , inorganic chemistry , chemistry , thin film , chemical engineering , nanotechnology , organic chemistry , metallurgy , biochemistry , engineering , gene
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom