z-logo
open-access-imgOpen Access
Monolithic integration of GaAs p–i–n photodetectors grown on 300 mm silicon wafers
Author(s) -
H. Mehdi,
M. Martin,
S. David,
Jean-Michel Hartmann,
J. Moeyaert,
Marie-Léonor Touraton,
Christophe Jany,
Léopold Virot,
Jérémy Da Fonseca,
J. Coignus,
D. Blachier,
T. Baron
Publication year - 2020
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0030677
Subject(s) - responsivity , photodetector , dark current , materials science , optoelectronics , epitaxy , silicon , wafer , gallium arsenide , absorption (acoustics) , substrate (aquarium) , nanotechnology , oceanography , layer (electronics) , geology , composite material

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom