Open AccessSelf-aligned single-exposure deep x-ray lithography
Author(s) -
V. Nazmov,
B. G. Goldenberg,
E. Reznikova,
Martin Boerner
Publication year - 2020
Publication title -
aip conference proceedings
Language(s) - Uncategorized
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/5.0030469
Subject(s) - lithography , materials science , computer science , optoelectronics
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