Impact of the SiO2 interface layer on the crystallographic texture of ferroelectric hafnium oxide | Zendy

Maximilian Lederer | Zendy; André Reck | Zendy; Konstantin Mertens | Zendy; Ricardo Olivo | Zendy; Pratik Bagul | Zendy; Alireza M. Kia | Zendy; B. Volkmann | Zendy; Thomas Kämpfe | Zendy; Konrad Seidel | Zendy; Lukas M. Eng | Zendy

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Impact of the SiO2 interface layer on the crystallographic texture of ferroelectric hafnium oxide

Author(s) -

Maximilian Lederer,

André Reck,

Konstantin Mertens,

Ricardo Olivo,

Pratik Bagul,

Alireza M. Kia,

B. Volkmann,

Thomas Kämpfe,

Konrad Seidel,

Lukas M. Eng

Publication year - 2021

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/5.0029635

Subject(s) - materials science , texture (cosmology) , orthorhombic crystal system , microstructure , ferroelectricity , hafnium , crystallization , phase (matter) , layer (electronics) , thin film , oxide , crystallography , optoelectronics , chemical engineering , composite material , dielectric , metallurgy , crystal structure , nanotechnology , chemistry , zirconium , organic chemistry , artificial intelligence , computer science , engineering , image (mathematics)

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