Open AccessEstimation of plasma parameters in vanadium magnetron sputtering using optical emission spectroscopy at different experimental formation conditions
Author(s) -
Mohammed K. Khalaf,
Alaa N. A. Al-Gaffer,
Harakat Mohsin R.
Publication year - 2020
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/5.0027435
Subject(s) - electron temperature , argon , electron density , plasma , plasma parameters , plasma diagnostics , langmuir probe , atomic physics , sputter deposition , materials science , glow discharge , sputtering , analytical chemistry (journal) , electron , chemistry , thin film , physics , nanotechnology , quantum mechanics , chromatography
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