Open AccessThe effect of thickness on the properties of Zr-Hf-N thin films prepared by reactive co-magnetron sputtering
Author(s) -
Jedsada Prathumsit,
G. Gitgeatpong,
Wuttichai Phae-ngam,
Chanunthorn Chananawathorn,
Tossaporn Lertvanithphol,
Mati Horprathum
Publication year - 2020
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/5.0023274
Subject(s) - hafnium , zirconium nitride , materials science , sputtering , zirconium , thin film , sputter deposition , microstructure , wafer , analytical chemistry (journal) , nitride , cavity magnetron , silicon , composite material , metallurgy , optoelectronics , nanotechnology , layer (electronics) , chemistry , titanium nitride , chromatography
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