Open AccessEffect of post annealed treatment on HfN thin films prepared by DC reactive magnetron sputtering
Author(s) -
Wuttichai Phae-ngam,
Jedsada Prathumsit,
G. Gitgeatpong,
Chanunthorn Chananawathorn,
Tossaporn Lertvanithphol,
Bunpot Saekow,
Hideki Nakajima,
Mati Horprathum
Publication year - 2020
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/5.0023267
Subject(s) - materials science , x ray photoelectron spectroscopy , thin film , sputter deposition , scanning electron microscope , analytical chemistry (journal) , sputtering , wafer , annealing (glass) , silicon , optoelectronics , chemical engineering , metallurgy , composite material , nanotechnology , chemistry , chromatography , engineering
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