Open AccessCrAlN film hardness uniformity affected by nitrogen content
Author(s) -
Chutima Paksunchai,
Chirawat Chantharangsi
Publication year - 2020
Publication title -
aip conference proceedings
Language(s) - Uncategorized
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/5.0023044
Subject(s) - nanoindentation , materials science , crystallinity , nitride , nitrogen , sputtering , x ray photoelectron spectroscopy , lattice constant , analytical chemistry (journal) , composite material , chemical engineering , diffraction , thin film , nanotechnology , chemistry , physics , organic chemistry , optics , layer (electronics) , chromatography , engineering
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