Open AccessAtmospheric He/O2 plasma jet fine etching with a scanning probe microscope
Author(s) -
Kenta Nakazawa,
Sho Yamamoto,
Ei Nakagawa,
Akihisa Ogino,
M. Shimomura,
Futoshi Iwata
Publication year - 2020
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0017952
Subject(s) - etching (microfabrication) , materials science , atmospheric pressure plasma , scanning electron microscope , plasma , reactive ion etching , scanning probe microscopy , jet (fluid) , plasma etching , analytical chemistry (journal) , microscope , optoelectronics , nanotechnology , optics , chemistry , composite material , physics , layer (electronics) , quantum mechanics , chromatography , thermodynamics
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