Open AccessRole of plasma parameters on the characteristics properties of flexible transparent ITO films deposited by 3D facing and planar facing magnetron sources
Author(s) -
Bibhuti B. Sahu,
Min W. Lee,
Long Wen,
Jeon G. Han
Publication year - 2020
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0017519
Subject(s) - materials science , indium tin oxide , cavity magnetron , sputter deposition , substrate (aquarium) , optoelectronics , plasma , deposition (geology) , transmittance , thin film , electrical conductor , electrical resistivity and conductivity , current density , transparent conducting film , indium , sputtering , composite material , nanotechnology , electrical engineering , paleontology , oceanography , physics , engineering , quantum mechanics , sediment , geology , biology
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