Open AccessResponse to “Comment on ‘Phase transformation in MOCVD growth of (AlxGa1−x)2O3 thin films’” [APL Mater. 8, 089101 (2020)]
Author(s) -
A F M Anhar Uddin Bhuiyan,
Zixuan Feng,
Jared M. Johnson,
HsienLien Huang,
Jith Sarker,
Menglin Zhu,
Md Rezaul Karim,
Baishakhi Mazumder,
Jinwoo Hwang,
Hongping Zhao
Publication year - 2020
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/5.0014806
Subject(s) - metalorganic vapour phase epitaxy , materials science , thin film , phase (matter) , transformation (genetics) , chemical engineering , nanotechnology , epitaxy , chemistry , organic chemistry , layer (electronics) , biochemistry , engineering , gene
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