Open AccessHigh-yield green fabrication of colloidal silicon quantum dots by low-temperature thermal cracking of porous silicon
Author(s) -
Toshihiro Nakamura,
Nobuyoshi Koshida,
Yuan Ze,
Jun Otsubo
Publication year - 2020
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/5.0014206
Subject(s) - materials science , silicon , fabrication , cracking , porous silicon , colloid , porosity , thermal , yield (engineering) , quantum dot , composite material , nanotechnology , chemical engineering , metallurgy , medicine , alternative medicine , physics , pathology , engineering , meteorology
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