Open AccessExcellent ferroelectricity of 50 nm-thick doped HfO2 thin films induced by annealing with a rapid-heating-temperature process
Author(s) -
Zhiyong Quan,
Meimei Wang,
Xiao Zhang,
Huihui Liu,
Wei Zhang,
Xiaohong Xu
Publication year - 2020
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0013511
Subject(s) - ferroelectricity , materials science , annealing (glass) , thin film , doping , pulsed laser deposition , optoelectronics , analytical chemistry (journal) , nanotechnology , dielectric , composite material , chemistry , chromatography
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