Open AccessH2O vapor assisted growth of β-Ga2O3by MOCVD
Author(s) -
Fikadu Alema,
Yuewei Zhang,
Akhil Mauze,
Takeki Itoh,
James S. Speck,
B. Hertog,
A. Osinsky
Publication year - 2020
Publication title -
aip advances
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0011910
Subject(s) - metalorganic vapour phase epitaxy , chemical vapor deposition , electron mobility , epitaxy , analytical chemistry (journal) , doping , materials science , water vapor , impurity , thin film , surface roughness , chemistry , nanotechnology , optoelectronics , layer (electronics) , organic chemistry , chromatography , composite material
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