Impact of fluorine doping on solution-processed In–Ga–Zn–O thin-film transistors using an efficient aqueous route
Author(s) -
Masashi Miyakawa,
Mitsuru Nakata,
Hiroshi Tsuji,
Hiroaki Iino,
Yoshihide Fujisaki
Publication year - 2020
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0003855
Subject(s) - thin film transistor , materials science , doping , fluorine , optoelectronics , oxide , oxide thin film transistor , transistor , aqueous solution , semiconductor , metal , nanotechnology , electrical engineering , metallurgy , chemistry , layer (electronics) , engineering , voltage
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