Open AccessInfluence of post-deposition annealing on the photoelectrochemical performance of CuBi2O4 thin films
Author(s) -
Marlene Lamers,
Michael Sahre,
M. Müller,
Daniel AbouRas,
Roel van de Krol,
Fatwa F. Abdi
Publication year - 2020
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/5.0003005
Subject(s) - materials science , annealing (glass) , photocurrent , pulsed laser deposition , thin film , band gap , crystallinity , oxide , semiconductor , optoelectronics , chemical engineering , nanotechnology , metallurgy , composite material , engineering
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom