Open AccessCharacteristics of Ni-based ohmic contacts on n-type 4H-SiC using different annealing methods
Author(s) -
Ziwei Zhou,
Weiwei He,
Zhenzhong Zhang,
Jun Sun,
Adolf Schöner,
Zedong Zheng
Publication year - 2021
Publication title -
nanotechnology and precision engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.232
H-Index - 12
eISSN - 2589-5540
pISSN - 1672-6030
DOI - 10.1063/10.0003763
Subject(s) - ohmic contact , annealing (glass) , materials science , nickel , diffraction , contact resistance , silicon , metallurgy , analytical chemistry (journal) , composite material , optics , chemistry , physics , layer (electronics) , chromatography
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