Open AccessComment on ‘‘Exact analytical solution to diffusion equation for ion-implanted dopant profile evolution during annealing’’ [Appl. Phys. Lett. 5 0, 155 (1987)]
Author(s) -
John R. King
Publication year - 1987
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.98585
Subject(s) - dopant , annealing (glass) , ion , ion implantation , materials science , diffusion , diffusion equation , thermodynamics , doping , physics , quantum mechanics , optoelectronics , economy , economics , service (business)
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