Open AccessErratum: Thermal oxidation of hafnium silicide films on silicon
Author(s) -
S. P. Murarka,
C. C. Chang
Publication year - 1981
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.92507
Subject(s) - hafnium , silicide , silicon , thermal oxidation , materials science , optoelectronics , metallurgy , zirconium
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