Erratum: Epitaxial regrowth of evaporated amorphous silicon by a pulsed laser beam
Author(s) -
Péter Révész,
Győző Farkas,
G. Mezey,
J. Gyulai
Publication year - 1979
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.90892
Subject(s) - materials science , epitaxy , silicon , optoelectronics , amorphous solid , amorphous silicon , laser , laser beams , optics , nanotechnology , crystallography , crystalline silicon , chemistry , physics , layer (electronics)
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