Open AccessIntermittent-contact scanning capacitance microscopy imaging and modeling for overlay metrology
Author(s) -
S. Mayo,
Joseph J. Kopanski,
William F. Guthrie
Publication year - 1998
Language(s) - English
Resource type - Conference proceedings
DOI - 10.1063/1.56912
Subject(s) - metrology , overlay , capacitance , materials science , microscopy , optoelectronics , optics , computer science , nanotechnology , physics , electrode , quantum mechanics , programming language
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