Open AccessOptical densitometry applications for Ion Implantation
Author(s) -
John P. Esteves,
Michael J. Rendon
Publication year - 1998
Language(s) - Uncategorized
Resource type - Conference proceedings
DOI - 10.1063/1.56904
Subject(s) - ion implantation , metrology , materials science , wafer , semiconductor , ion , semiconductor device , optoelectronics , optics , dosimetry , dose profile , dopant , nanotechnology , physics , doping , nuclear medicine , medicine , layer (electronics) , quantum mechanics , imaging phantom
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom