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Evaluation of an automated spectroscopic ellipsometer for in-line process control
Author(s) -
Christopher Pickering,
J. Russell,
V. Nayar,
J. Imschweiler,
H. Wille,
S. J. Harrington,
C. Wiggins,
J.L. Stehlé,
J.P. Piel,
J. Bruchez
Publication year - 1998
Language(s) - English
Resource type - Conference proceedings
DOI - 10.1063/1.56903
Subject(s) - wafer , throughput , materials science , ellipsometry , cleanroom , optoelectronics , process control , cmos , interfacing , computer science , process (computing) , electronic engineering , nanotechnology , engineering , thin film , computer hardware , telecommunications , wireless , operating system

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