Open AccessInfrared spectroscopy for process control and fault detection of advanced semiconductor processes
Author(s) -
P. Rosenthal,
W H Aarts,
A. Bonanno,
Duane S. Boning,
S. Charpenay,
Aaron E. Gower,
Maxi Richter,
T. Smith,
P. M. Solomon,
Martin L. Spartz,
Christopher E. Nelson,
A. Waldhauer,
Jinping Xu,
Victor A. Yakovlev,
W. Zhang,
Linda J. S. Allen,
B. Cordts,
Martin S. Brandt,
R. Mundt,
Andrew Perry
Publication year - 1998
Language(s) - English
Resource type - Conference proceedings
DOI - 10.1063/1.56898
Subject(s) - wafer , materials science , fourier transform infrared spectroscopy , silicon on insulator , optoelectronics , semiconductor device fabrication , silicon , semiconductor , metrology , computer science , electronic engineering , nanotechnology , optics , engineering , physics
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